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    Please use this identifier to cite or link to this item: http://ir.nfu.edu.tw:80/handle/392390000/5238

    題名: Growth and characterization of polycrystalline Si films prepared by hot-wire chemical vapor deposition
    作者: Wuu, Dong-Sing;Lien, Shui-Yang;Mao, Hsin-Yuan;Wu, Bing-Rui;Hsieh, In-Cha;Yao, Pin-Chuan;Wang, Jui-Hao;Chen, Wen-Chun
    日期: 2005
    上傳時間: 2015-11-09T10:22:50Z
    URI: http://ir.nfu.edu.tw:80/handle/392390000/5238
    Appears in Collections:[光電工程系(含光電與材料科技研究所)] 期刊論文

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